Faced with ever-increasing pressure to maximize production yields in order to compete in world markets, today's microelectronics firms are also challenged with the demand to produce devices with greater memory, faster speeds and reduced size.
The dilemma to achieve greater production yields and greater product performance in the face of shrinking device geometries has intensified the need for filtration at every stage of semiconductor fabrication. For over fifty years, Pall Corporation has continued to set the standard in filtration and separations technology. We have applied that standard to the purification and filtration of fluids and gases used in the semiconductor fabrication process, including chemical, water, gas and photoresist applications.
Because of Pall's extensive knowledge of the semiconductor fabrication process and the company's history of innovation and advanced scientific laboratory services, customers around the globe can depend on Pall to provide the best solutions to the toughest fluid clarification problems.
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